3D00100 - SEMI 3D1 - Terminology for Through Silicon via Geometrical Metrology StdPbc-0924 This Standard only applies to

This Standard only applies to components for systems which control flow of ≤50 slm nitrogen equivalent at 308 kPa (44

SEMI C30-0301 (technical revision)

26-0301 (Withdrawn 0312

本文書の目的は，半導体産業で使用される水酸化ナトリウム（固体）に対する要求条件を標準化し，またこれらのスタンダードをサポートする試験手順を標準化することである。試験方法は，統計的に有効な結果を示している。SEMI C1の通り代替法の妥当性が確認されたなら，それを使用してもよい。

2  This Specification and Guide also provides assay and impurity limits for higher purity Tiers of sulfuric acid for which a need has been identified

3D00100 - SEMI 3D1 - Terminology for Through Silicon via Geometrical Metrology StdPbc-0924 This Standard only applies toClear and commonly accepted definitions are needed for efficient communication and to prevent misunderstanding between buyers and vendors of metrology equipment and manufacturing services. The purpose of this Document is to provide a consistent terminology for the understanding and discussion of metrology issues important to through silicon vias (TSV). The scope of this Document is limited to the definitions of terms used to specify measured