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M01000 - SEMI M10 - Terminology for Identification of Structures and Features Seen on Gallium Arsenide Wafers StdPbc-0525 SEMI E168-0915 (Reapproved 0923)

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Description

SEMI E168-0915 (Reapproved 0923)

distribute

through the oxide layers

2-0417 — Specification for 125 mm (5 inch) Port for Standard Mechanical Interface (SMIF)

SEMI E150 — Guide for Equipment Training Best Practices

M01000 - SEMI M10 - Terminology for Identification of Structures and Features Seen on Gallium Arsenide Wafers StdPbc-0525 SEMI E168-0915 (Reapproved 0923)The purpose of this Standard is to list, illustrate, and define various characters, features, and contaminants that are seen on highly polished GaAs wafers and present recommended practices for observation of these defects. These occurrences are frequently referred to as surface defects. The defects and common synonyms are arranged alphabetically in 4, and each structure is referred to by its most common name and, in some cases, probably origins. Two

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