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This document defines several standard overlay-metrology patterns that are used by metrology equipment users to evaluate and test micropatterning equipment and processes in integrated circuit (IC) manufacturing
are determined in this Test Method
本スタンダードでは，各用語について定義し，それを解釈することで，
This Standard applies to factory components that collect
together with the referenced standards
P04400 - SEMI P44 - マスク装置向けオープン・アートワーク・システム・インターチェンジ・スタンダード（OASIS®）の仕様 StdTpc-Documentation/Training This document defines several standardglobal Micropatterning Committee2009513global Audits and Reviews Subcommittee20096www. semi. org20097CD ROM200511200811 OASISOASIS. MASK Referenced SEMI Standards SEMI P39 OASIS Open Artwork System InterchangeStandard
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